Manufacturer:AG Associates
AG Heatpulse 310 is a rapid thermal processor which uses
high-intensity, visible radiation to heat single wafer for short periods
at precisely controlled temperatures. These capabilities, combined with
the heating chamber's cold-wall design, superior heating uniformity, provide
significant advantages over conventional furnace processing and conventional
RTP systems.
1.2-4" wafer,Manual Operation
2.Closed-loop temperature control with pyrometer or thermocouple temperature
sensing.
3.Precise time-temperature profiles tailored to suit specific process
requirements.
4.High-intensity visible radiation heats wafers for short periods. Fast
heating and cooling rates unobtainable in conventional technologies.
5.Consistent wafer-to-wafer process cycle repeatability.
6.Elimination of external contamination.
7.Small footprint and energy efficiency.
AG 310 RTA RTP is a versatile tool, which is useful
for many applications:
1. Ion Implant Activation
2. Polysilicon Annealing
3. Oxide Reflow
4. Silicide Formation
5. Contact Alloying
6. Oxidation and Nitridation
We can also
provide Allwin21 Corp proprietary AW Control Software and Superior Temperature
Control Technology to upgrade the refurbished AG Heatpulse 310 which provides
significant advantages.
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