We are the exclusive
licenced manufacture for AG Heatpulse 610. We are manufacturing the AccuThermo
AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative
software and more advanced temperature control technologies
AccuThermo
AW 610
is a new rapid thermal processor which uses high-intensity, visible radiation
to heat single wafer for short periods at precisely controlled temperatures.
These capabilities, combined with the heating chamber's cold-wall design,
superior heating uniformity,advanced temperature control technology and
AW 900 new software, provide significant advantages over conventional
furnace processing and conventional RTP systems.
AccuThermo
AW 610's
key features include:
*Advanced ERP Pyrometer for
precise high temperature measurement
*Add timer watch for the oven safety issue (the original has no safety
interlock for the computer locks up, chamber would be burned if the computer
locks up when process running).
*The new software with power summary function to detect either lamp failure
or sensor failure
* 3-6" round wafer or up to ,Manual Operation
* Use Sumpower as a parameter to control the uniformity of the wafer.
* Closed-loop temperature control with pyrometer or thermocouple temperature
sensing.
* Precise time-temperature profiles tailored to suit specific process
requirements.
* High-intensity visible radiation heats wafers for short periods. Fast
heating and cooling rates unobtainable in conventional technologies.
* Consistent wafer-to-wafer process cycle repeatability.
* Elimination of external contamination.
* Small footprint and energy efficiency.
* Software calibration and easy to be done.
* More functions and I/O hardware ¡°exposed¡± for easier maintenance and
trouble shooting.
* It is easy to edit recipe with GUI and graph display.
* Save all process data on the computer hard disk.
* A/D and D/A precision is 14 to 16 bits.
* Detect in process and with color curve displayed on the screen.
* Lamp damage detect in process.
* Software watch dog to eliminate machine damage duo to the computer locks
up or freeze.
* Sensor status detect function.
* On line help function
AccuThermo
AW 610 RTA RTP is a versatile
tool, which is useful for many applications:
+ Ion Implant Activation
+ Polysilicon Annealing
+ Oxide Reflow
+ Silicide Formation
+ Contact Alloying
+ Oxidation and Nitridation
+ GaAs Processing
For a bibliography and reprints of technical
journal articles regarding these AccuThermo applications, contact AG-RTP
Marketing Communications Department.
AccuThermo
AW 610 RTA RTP performance
specification:
& Recommended Steady-State Temperature Range: 100-1250 C.
& Steady-State Temperature Stability: +/- 1 C.
& Temperature Monitoring Mechanisms: Extended Range Pyrometer (ERP),used
for process temperatures from 600 C to 1250 C or a thermocouple, used
for process temperatures below 800 C.
& Heating Rate: 1-200 C per second, user-controllable, 10 C to 120
C for wafer, Programmable.
& Cooling Rate: Temperature dependent; max 150 C per second.
& Maximum Non-uniformity:
Radiant Flux: ¡À0.25%
Sheet resistivity(Post-anneal sheet resistivity measured on a 150mm wafer
annealed at 1100¡ã C for 10 seconds. R&D models optimized for slip
control):
<2% (Dose Monitoring Units)
<1.35% (R&D Units)
Implant: As 1E16 50 KeV with implant uniformity 0.3%
& Steady state process time 0 to 30000 sec programmable
& Wafer Sizes for the AccuThermo
AW 610: 2", 3", 4",
5" and 6".
& Process Gases: The AccuThermo
AW 610 system delivers one non-corrosive
process gas with one MFC. Up to four MFC is optional.
AccuThermo
AW 610 specifications above
may change as different models are introduced or as design enhancements
are implemented.
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