Maker:AG Associates
Condition:Refurbished and upgraded
Refurbished by:Allwin21 Corp.
AG Heatpulse 410 is a rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity, provide significant advantages over conventional furnace processing and conventional RTP systems.
Manual Operation
Closed-loop temperature control with pyrometer or thermocouple temperature sensing.
Precise time-temperature profiles tailored to suit specific process requirements.
High-intensity visible radiation heats wafers for short periods. Fast heating and cooling rates unobtainable in conventional technologies.
Consistent wafer-to-wafer process cycle repeatability.
Elimination of external contamination.
Small footprint and energy efficiency.
AG 410 RTA RTP is a versatile tool, which is useful for many applications:
• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• Oxidation and Nitridation
Typical Application Area v
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v Chip Maufacture
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Compound Industry:GaAs, GaN, GaP, GaInP,InP and SiC
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v Optronics:Planar optical waveguides,LASERs, LEDs and VCSELs
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v Biomedical
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v MEMS
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v Nanotechnology
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