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Matrix 105 Matrix 205 Gasonics Aura 1000 Gasonics Aura 2000LL Gasoncis Aura 3010 Gasonics L3510 Branson IPC L3200 Branson IPC 3000

LFE PDS PDE 301 LFE PDS PDE 504 TOK OPMA 1250 Plasma Asher Genesis Microstar 200C Plasma Asher Drytek Megastrip 6 H.F.

Gasoncis Aura 1000 Plasma Asher Equipment

Maker:Gasonics

Condition:Refurbished and upgraded

Refurbished by:Allwin21 Corp.

Gasonics is a Registered Trademark of Novellus Corp.GaSonic Aura 1000 Plasma System is the microprocessor controlled down-stream, or “ afterglow” photoresist stripper that will strip the front and backside of a wafer, typically in less than one minute. The unit is fully automated, cassette-to-cassette, and is a single-wafer process design.

Single-wafer process

3”, 4”, 5” and 6” wafer capability

Automatic Equip robot wafer loader / unloader

Infrared heat source for process temperature control

Downstream processing: No wafer radiation damage(<0.1 volt CV shift)

Automatic photo emission type end-point detection

Front and backside resist removal

GaSonic Aura 1000 Applications

Photoresist Stripping

High dose implant (As+, B+, P+)
Post-polysilicon etch
Post-metal etch
Post-oxide etch
Rework

Controlled Resist Removal

Post-develop descum (pre-etch)
Dry/wet process capability
Resist planarization
Uniformity capability (5% 1s)

Matrix 105 Matrix 205 Gasonics Aura 1000 Gasonics Aura 2000LL Gasoncis Aura 3010 Gasonics L3510 Branson IPC L3200 Branson IPC 3000 LFE PDS PDE 301 LFE PDS PDE 504 TOK OPMA 1250 Plasma Asher Genesis Microstar 200C Plasma Asher Drytek Megastrip 6 H.F.

Gasoncis Aura 1000 Plasma Asher Equipment

Matrix 105 Matrix 205 Gasonics Aura 1000 Gasonics Aura 2000LL Gasoncis Aura 3010 Gasonics L3510 Branson IPC L3200 Branson IPC 3000

LFE PDS PDE 301 LFE PDS PDE 504 TOK OPMA 1250 Plasma Asher Genesis Microstar 200C Plasma Asher Drytek Megastrip 6 H.F.