Gasoncis L3510 Plasma Asher Equipment
Maker:Gasonics
Condition:Refurbished and upgraded
Refurbished by:Allwin21 Corp.
Gasonics is a Registered Trademark of Novellus Corp.The Gasonics L3510 is a versatile downstream photoresist removal system,designed for clean, damage-free removal of the most difficult resist structures.Utilizing the production-proven L-Series platform, the L3510 has a wide process window due to its patented microwave plasma source.Programmable heating and process controls contribute to the systems’ unparalleled process flexibility.3”, 4”, 5”, 6” and 8”wafer capability.
We can also provide advanced Equip Robot transfer wafer technology ,AW Control Software and Superior Temperature Control Technology to upgrade the refurbished Gasonics L3510 which provides the following significant advantages.
- Use Equip robot wafer transfer instead of the Frog robot of the original, which will decrease the down time and low the wafer damage, particles greatly.
- Pentium PC computer equipped with DOS Windows.
- Interface control board with parallel connectors between PC computer and the Aura-3000 system
- New 16 bits A/D measurement system to replace original 12 bits A/D system to improve the accuracy of the measurements of gas flow, vacuum pressure, EOP, temperature of the wafer, etc. to improve the repeatability of the Asher process.
- New 14 bits D/A system to replace original old 8 bits D/A to improve the accuracy of the set point of the vacuum pressure, gas flow, etc.
- Add new RTP system to get more accuracy temperature control to improve the repeatability of the process.
- User-friendly recipe editor with gas flow set point, vacuum pressure set point, RF on or off set up, temperature setup etc.
- New GUI interface with curves display of the temperature, vacuum pressure, gas flow, RF status, EOP signal etc. during the process.
- Saved all process data on the local hard disk and send data to the server if it is needed (option).
- Saved all operation function, date, time and error message on the lot file.
- Wafer ID reading function to read wafer ID and use the wafer ID for the data ID to save the process data. Data saved with 4 layers: (1) directory (say year 2003,2004), (2) lot ID, (3) Date Time or step ID, (4) wafer ID. So it is easy to trace the data.
- Manual and auto process running.
- System diagnostics for the quick diagnostic of the system
- Easier I/O set and checks function for the Maintenance.
- Higher through put.
- Advanced accurate temperature control to make much better repeatability.
- All process data saved and easier for failure analyzer and process debug.
- “Exposed” I/O, A/D, D/A is easier for troubleshooting and maintenance.
- Tools would be painted and cleaned up
- Chamber would be re-anodized .
- The frame would be re-painted.
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