The LFE PDS/PDE 301 is a barrel plasma etcher that uses oxygen to etch organic films and residues such as photoresist in a process commonly referred to as "de-scumming." During a normal run for the LFE PDS/PDE 301 Barrel Etcher, the chamber is evacuated to under 0.5 torr pressure. A regulated flow of oxygen gas is introduced into the chamber and RF energy is applied to the chamber coils, which creates an oxygen plasma which does the etching. The oxygen ions in the plasma react with organics, such as photoresist, oxidizing or descumming the compounds off of the surface. The oxidized organics are pumped out of the LFE PDS/PDE 301 Barrel Etcher's chamber as exhaust gas.

LFE PDS/PDE 301 Features:
POWER RATING : 600 watts continuous input
QUARTZ REACTOR:1ea 8" dia. x 8" long,6”X7” quartz plate.
OPERATING PRESSURE RANGE:0.1 - 10 torr
VACUUM SEALS : Silicone O rings and bell jar gasket
REACTOR WINDOW: Hinged and spring loaded, with latch for open position
IMPEDANCE CONTROL: Matches from 10-600 watts to present input impedance of 50 ohms at RF power input connector. Automatic impedance matching once preset. 

Allwin21 Corp. can also provide   AW Control Software ,New controller and ENI RF Generator to upgrade the refurbished LFE PDS/PDE 301 tools  which provides the following significant advantages.  

*     Auto processing with RF, gas flow and timer set up

*    2 process gas with MFC 

*    Upgrade with new software and controller

*    Touch screen computer

*    3 gases by MFC(Option,50 sccm up to 30000 sccm)

*    Baratron to read the pressure(Option)

*     Throttle valve to control the pressure to keep the process repeatable(Option)

*     ENI RF generator.