Home
Equipment
AccuThermo AW 410
AccuThermo AW 610
AccuThermo AW 810
AccuThermo AW 820
AccuThermo AW 830
AccuThermo AW 610V
AccuThermo AW 820V
AccuThermo AW 860V
Parts
Heatpulse 210 Spare Parts
Heatpulse210 Manual
Minipulse 310 Spare Parts
Minipulse310 Manual
Heatpulse 410 Spare Parts
Heatpulse410 Manual
Heatpulse 610 Spare Parts
Heatpulse610 Manual
Heatoulse 610 I Spare Parts
Heatpulse610I Manual
Service
Heatpulse 210 Service
Heatpulse210 Refurbishment
Heatpulse210 Upgrade
Minipulse 310 Service
Minipulse310 Refurbishment
Minipulse 310 RTA Upgrade
Heatpulse 410 Service
Heatpulse 410 Refurbishment
AG Associates Heatpulse410 Upgrade
Heatpulse 610 Service
Heatpulse610 Refurbishment
AG 610 Rapid Thermal Process Upgrate
Heatpulse 610 I Service
Heatpulse610I Refurbishment
AG 610I Rapid Thermal Anneal Upgrade
RTA RTP RTO RTN Articles
Rapid Thermal Process
Atmospheric Rapid Thermal Processors
Vacuum Rapid Thermal Processors
Why not sell used Hearpulse 210/410/610 RTA
Temperature Measured vs. Actual
Contact Us
Site Map

   

AccuThermo AW 810 Atmosphere RTA RTP   

AccuThermo AW 810M is a desktop rapid thermal processor for 5 to 8 inch wafer , which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems. 

Specification.

1.1          Wafer Size 5 inch  to 8 inch configuration

1.2              Single Wafer Process.

1.3              Aluminum chamber with water cooling and gold plating for better uniformity

1.4              Extended Range Pyrometer(ERP) for high temperature sensor

1.5              Isolated Quartz Tube for clean environment for wafer

1.6              Bottom and top heating with Radiation heating lamp module

1.7              Precise Temperature/Time control, Temperature measuring  precision 1C.

1.8              Multiple cycle processing capability

1.9              Steady Temp Range: 600C to 1250C for ERP pyrometer sensor(Optional), 100C to 800C for Thermocouple(Can not use thermocouple for up to 750C  for Si wafer due to the reaction between Si

                wafer and thermocouple).

1.10          Steady state process time 0 to 3000 sec programmable

1.11          Temp Ramp-up Speed: 10C to 100C for wafer, Programmable

1.12          Ramp down speed 10C - 100C for wafer,Non-Progammable.

1.13          Pentium Computer with 17 LCD Monitor, standard keyboard and mouse.

1.14          Software calibration and easy to be done.

1.15          More functions and I/O hardware exposed for easier maintenance and trouble shooting.

1.16          It is easy to edit recipe with GUI and graph display.

1.17          Save all process data on the computer hard disk.

1.18          A/D and D/A precision is 14 to 16 bits.

1.19          Detect in process and with color curve displayed on the screen.

1.20          Software has power summary function to detect either lamp failure or sensor failure.

1.21          Software watch dogto eliminate machine damage duo to the computer locks up or freeze.

1.22          On line help function.

 

RTA RTP RTO RTN Articles
Rapid Thermal Process
Atmospheric Rapid Thermal Processors
Vacuum Rapid Thermal Processors
Why not sell used Hearpulse 210/410/610 RTA
Temperature Measured vs. Actual

Home|Equipment|Parts|Service|RTA RTP RTO RTN Articles|Contact Us|Site Map